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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
277
Mots-clés
Atomic layer etching
Nanocomposite
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
BOMBARDMENT
B3 Solar cells
B1 Inorganic compounds
AZO thin films
NEXAFS
Structure
Kirkendall effect
B2 Semiconducting indium compounds
CaTiO3Pr^3^+
Amorphous
Bixbyite
A Thin films
Aluminium nitride
Band alignment
Ablation laser
Plasmas froids
A Multilayers
AlN
Vanadium Sesquioxide
Amyloid precursor
Alloying
Titanium dioxide
A1 Characterization
V2O3
Colloidal solution
Biocapteurs
Cathepsin
Applications industrielles
Band gap
X-ray diffraction
Low-pressure plasma processing
TiO2
C Photoelectron spectroscopy
X-ray photoelectron spectroscopy
Bipolar resistive switching BRS
CIGSe
Plasma etching
Avalanche breakdown
A3 Physical vapor deposition processes
Carbon nitride
CNTs’ collapse
Biomasse
Chalcogenide glass
CH4
Sputtering
A Chalcogenides
Etching
Buffer Couple
Selenization
Physical vapor deposition
Alzheimer's disease
Optical properties
B2 Semiconducting alloys
Chalcogenide
Semiconductors
Calcined clay
Spectroscopic ellipsometry
PECVD
Chemical detection
CHLORINE PLASMAS
Sol-gel
Chemical and biological sensors
AuCu alloy
Thin films
Transfert d'énergie
Aryl-diazonium salts
Films
Anatase
Scanning electron microscopy
Copper
Functionalization
Non-volatile memory
Nanotubes
Oxides
Ambipolar material
Biofilms microbiens
Carbon nanotubes
Resistive switching
SF 6
B2 Quaternary
Thin film
A-CNx
Atomic force microscopy
Carbon
Transmission electron microscopy
B Chemical synthesis
TEM
3 nm in size
Capacitance
Adsorption
Mott insulator
Chalcogenides
Residual stress
Mott insulators
Carbon Nanotube
Magnetron sputtering
XPS